modifying and fine controlling of silver nanoparticle nucleation sites and sers performance by double silicon etching process

Different forms of modified and well-controlled plasmonic silver nanoparticles (agnps) were synthesized by silver ion reduction process of porous silicon (ps). fine control of ps surface morphology was accomplished by employing two etching processes: light-induced etching (lie) and photo electrochemical etching (pece). the idea was to prepare excellent and reproducible surface-enhanced raman scattering (sers) substrates with high enhancement performance. ps surface modification was employed to create efficient and nearly uniformly distributed agnp hotspot regions with very high specific surface areas. reproducibility deviation of no more than 5% and enhancement factor of 1.2 × 1014 were obtained by sers measurements at very low, rhodamine 6g (r6g) dye, concentration 10−15 m. the ps morphology sers substrate was well discussed and analyzed using field emission scanning electron microscopy (fe-sem), x-ray diffraction spectroscopy (xrd), and raman measurements.