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impact of the coulomb potential and the electrostatic potential on the eigen-frequencies of the coupled plasmons
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نویسنده
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guan lulu ,zhang jing ,xu yonggang ,zhang jianxin ,li yongfang
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منبع
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plasmonics - 2020 - دوره : 15 - شماره : 2 - صفحه:351 -359
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چکیده
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In this paper, a coupled oscillator model is employed to describe the eigen-frequencies of the coupled plasmons, which are dominated by the coupled coefficient and the frequency offset defined by us. from this, we present a novel physical model to describe the influence of the coulomb potential and the electrostatic potential (cpep) on the coupled coefficient and the frequency offset. based on the finite element method, we simulate numerically the evolution of the absorption spectra of the microstructure unit composed of a simply metal nanostructure. the simulated results show that two resonant absorption peaks are asymmetrical with the change of the coupling distance between the nano-elements. with the cpep model, we not only explain successfully the asymmetrical behaviors of the peaks values of the absorption spectra with the change of the coupling distance but also obtain the resonant frequencies for different plasmons. the absorption spectra are simulated by the harmonic oscillator model, in which their calculated parameters originate from the cpep model, and the results are very well association with those of the numerical simulation.
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کلیدواژه
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eigen-frequencies ,frequency offset ,coulomb potential and electrostatic potential ,harmonic oscillator model
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آدرس
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shaanxi normal university, school of physics and information technology, china, shaanxi normal university, school of physics and information technology, china. xi’an shiyou university, school of electronic engineering, china, shaanxi normal university, school of physics and information technology, china. xi’an university of posts and telecommunications, school of science, china, shaanxi normal university, school of physics and information technology, china, shaanxi normal university, school of physics and information technology, china
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Authors
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