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Stevens-Johnson syndrome/toxic epidermal necrolysis overlap induced by fexofenadine
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نویسنده
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teo s.l. ,santosa a. ,bigliardi p.l.
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منبع
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journal of investigational allergology and clinical immunology - 2017 - دوره : 27 - شماره : 3 - صفحه:191 -193
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چکیده
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[no abstract available]
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کلیدواژه
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Antihistamine; Fexofenadine; Patch testing; Stevens-Johnson syndrome; Telfast-D; Toxic epidermal necrolysis
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آدرس
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national university hospital, Singapore, division of rheumatology,university medicine cluster,national university health system,singapore,department of medicine,yong loo lin school of medicine,national university of singapore, Singapore, division of rheumatology,university medicine cluster,national university health system,singapore,experimental dermatology group,institute of medical biology,a *star, Singapore
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Authors
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