structural, surface morphological, and optical properties of pulsed laser deposited mos2/zno microrods for optoelectronic applications

In the present work, hexagonal mos2/zno thin film was synthesized via pulsed laser deposition method. we studied the structural and optical properties of mos2/zno thin film deposited on si (100) substrate at room temperature using a nd:yag laser (248 nm, 10 ns pulse duration and 10 hz repetition rate). fesem images demonstrated a flower-like topography of mos2/zno with the well-defined hexagonal microrods and flat top surface. the band gap was determined from the analysis of uv-visible spectrum and found to be 2.90 ev for mos2/zno microrods and 3.12 ev for pure zno. the hexagonal wurtzite crystal structure of mos2/zno composite thin film was confirmed by xrd pattern. raman spectrum of mos2/zno microrods showed two characteristics peaks at 379 and 403 corresponding to  and  modes, respectively. enhancement of the near-band-edge ultraviolet emission was achieved by deposition of mos2 on the surface of zno microrods. the ossila four-point probe device measured the dc electrical conductivity. the results indicate that mos2/zno microrods are regarded as promising prospects for the future of optoelectronic applications.