synthesis of manganese oxide thin film by aerosol-assisted chemical vapor deposition

The production of transition metal oxides (tmos) thin films has become the attention of a great deal of research throughout academia and industry worldwide because of their various applications among common deposition techniques, chemical vapor deposition (cvd) is an attractive process for the production of tmos due to its capability to control composition, crystal structure and morphology of deposited film, even on large scales conventional cvd processes can be limited, however, by the need for suitably volatile precursors as a variant of conventional cvd processes aerosol-assisted (aa)cvd is a solution-based process which alleviates the need for volatile precursors and offers a wide range of precursors this paper reports the successful deposition of manganese oxide thin film on heated glass substrate (350°c) by aacvd method the precursor was a solution of manganese acetylacetonate (mn(acac)2) in methanol the microstructure and composition of the deposited are characterized using scanning electron microscopy (sem) and raman spectroscopy