advancements in plasma-enhanced chemical vapor deposition of a multi-walled carbon nanotubes on si/sio2 substrates: a comprehensive review

This review study offers a thorough investigation of the developments in the field of multi-walled carbon nanotubes (mwcnts) deposition on si/sio2 substrates using plasma-enhanced chemical vapor deposition (pecvd). using iron catalytic nanoparticles produced by the breakdown of fe(co)5, the study examines the growth mechanism of mwcnts. according to prior literature descriptions, iron oxide nanoparticles are deposited using a microwave plasma torch with a dual-flow nozzle electrode. the si/sio2 substrate is set up in a sample holder that can store several samples, each of which has a deposition area of 4 mm by 4 mm. argon acts as the carrier gas and flows at preset rates via the inner and outer channels. at 210 w of plasma power, the deposition process lasts for 15 seconds. the resulting mwcnts’ structural characteristics, such as density, alignment, and uniformity, are examined. this comprehensive review highlights the intricate interplay of process parameters and their influence on mwcnt growth. the insights provided contribute to a better understanding of pecvd-based mwcnt synthesis and pave the way for optimizing these processes for various applications, including electronic and energy devices.