Modeling and simulation of a chemical vapor deposition

We are motivated to model pe-cvd (plasma enhanced chemical vapor deposition) processes for metallic bipolar plates,and their optimization for depositing a heterogeneous layer on the metallic plate. moreover a constraint to the deposition process is a very low pressure (nearly a vacuum) and a low temperature (about 400k). the contribution of this paper is to derive a multiphysics system of multiple physics problems that includes some assumptions to simplify the complicate process and allows of deriving a computable mathematical model without neglecting the real-life processes. to model the gaseous transport in the apparatus we employ mobile gas phase streams,immobile and mobile phases in a chamber that is filled with porous medium (plasma layers). numerical methods are discussed to solve such multi-scale and multi phase models and to obtain qualitative results for the delicate multiphysical processes in the chamber. we discuss a splitting analysis to couple such multiphysical problems. the verification of such a complicated model is done with real-life experiments for single species. such numerical simulations help to economize on expensive physical experiments and obtain control mechanisms for the delicate deposition process. © 2011 j. geiser and m. arab.