structural, morphological and optical analysis of tio2 thin films prepared by rf magnetron sputtering

Thin layer of titanium dioxide has been deposited on a glass sheet using rf magnetron sputtering under different preparation conditions. phase, lattice parameters, optical features and morphology were investigated under different laboratory conditions in different thicknesses by using xrd, spectrophotometry and atomic force microscopic (afm), within the visible spectrum range. also, the lattice structure, in most cases, is tetragonal or a combination of tetragonal and orthorhombic. the band gap energy for each layer was measured using tauc’s plot. it was observed that the edge of absorption is reduced following an increase in thickness except for a thickness of 75 nm. by increasing the pressure, the band gap energy of the layers or the edge of absorption increases except for 0.04 mbar. by increasing the power, the band gap energy of the layers will change resulting in an increasing-decreasing trend in the edge of absorption, which can be the outcome of changes in the lattice formation.