Effects of Thermal Annealling Process on Optical, Electrical and Surface Properties of ZnO Semiconductor Films

In this study, zno semiconductor films were deposited on the glass substrates by ultrasonic spray pyrolysis (usp). all of the films were annealed at different temperatures to improve the physical properties and the effect of annealing on the electrical, optical and surface properties was investigated. transmittance and absorbance spectra of zno films were examined using uv-vis spectrophotometer. band gap values of the films were determined by optical method. also, thicknesses, refractive index (n) and extinction coefficient (k) values of the films were determined by spectroscopic ellipsometry (se). the surface topography and roughness values of zno films were investagetated by atomic force microscopy (afm). electrical resistivities of the films were determined using four probe technique. according to results; some physical properties of zno films were improved with annealling process and potential the of zno films was searched in various technological area.