The Effect of Substrate on Structural and Electrical Properties of Cu3N Thin Film by DC Reactive Magnetron Sputtering

The aim of this paper is to study the effect of substrate on the cu3n thin films. at first, cu3n thin films are prepared using dc magnetron sputtering system. then, structural properties, surface roughness, and electrical resistance are studied using x-ray diffraction (xrd), the atomic force microscope (afm) and four-point probe techniques, respectively. finally, the results are investigated and compared for glass and si substrates. the results show a phase transition in orientation from (111) and (100) planes to (200) plane when the substrate of the sample is changed from glass to si. also, the grain size of deposited particles on films is increased by changing the substrate from glass to si. then, afm results show that surface roughness on si substrate is more than that on the glass substrate. finally, four-point probe techniques show that surface electrical resistivity is increased sharply by changing the substrate from silicon to glass.