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Characterization of Sputtered NiTi Shape Memory Alloy Thin Films.
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نویسنده
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Sanjabi S. ,Naderi M. ,Zare Bidaki H. ,Sadrnezhaad S. K.
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منبع
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scientia iranica - 2009 - دوره : 16 - شماره : 3 - صفحه:248 -252
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چکیده
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During recent years, many investigations have been carried out to determine how to select different materials for the making of micro electro mechanical systems (mems) and bio-mems. the niti shape memory alloy thin film has been much regarded as a promising candidate for mems due to its unique shape memory effect and high energy output. in this research, niti thin film was fabricated using a sputtering technique from separate elemental ni and ti targets. the characterizations of the deposited films were investigated using different analysis techniques, such as field emission sem, dsc, xrd, electrical resistivity measurement and nanoindentation.
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کلیدواژه
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NiTi thin film; Sputtering; Characterization; Shape memory effect.
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آدرس
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tarbiat modares university, Department of Materials Science and Engineering , ایران, tarbiat modares university, Department of Materials Science and Engineering , ایران, tarbiat modares university, Department of Materials Science and Engineering , ایران, sharif university of technology, Department of Materials Science and Engineering , ایران
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پست الکترونیکی
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sanjabi@modares.ac.ir
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Authors
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