Deposition of Al/Cu Multilayer By Double Targets Cylindrical DC Magnetron Sputtering System

A cylindrical direct current magnetron sputtering coater with twotargets for deposition of multilayer thin films and cermet solarselective surfaces has been constructed. the substrate holder wasable to rotate around the target for obtaining the uniform layer andseparated multilayer phases. the al/ cu multilayer film wasdeposited on the glass substrate at the following conditions:working gas = pure argon, working pressure = 1 pa, cathodecurrent = 8 a and cathode voltage = -600 v .microstructure of thefilm was investigated by x-ray diffraction and the scanningelectron microscopy analyses. the elements profile was determinedby glow discharge–optical emission spectroscopy analysis. duringdeposition, both targets with magnetron configuration were sputteredsimultaneously by argon ions. a plasma column on the targetssurface was generated by a 290 g permanent magnet unit. two dcpower supply units with three phases input and maximum output of12 a/1000v were used to deposit the multilayer thin films. a controlphase system was used to adjust output voltage.