Electrophoretic Deposition Technique For Coating Nano “Tio_2” on Ss316l Alloy

The aim of this work was to use the electrophoretic deposition (epd) technique for the deposition of nano-”tio_2” layers directly on an ss316l substrate. the nano-”tio_2” films were deposited on an ss316l alloy with various parameters, such as potential, time of deposition and annealed temperature—the optimum parameters required for the development of stable nano-”tio_2” layer coating. the results obtained from the x-ray diffraction (xrd) and fesem tests in this study showed that the “tio_2” layers sintered at 400 °c were amorphous. the xrd patterns showed the anatase phase at 600 °c for 1 h. the heat treatment of “tio_2” layers led to good adhesion with the ss316l alloy. the heat treatment above 500 °c led to the agglomeration of nano-”tio_2” layers from 28 nm to 78 nm at 600 °c. the thickness of the nano-”tio_2” coating increased with the deposition time and potential. the optimum thickness of the nano-”tio_2” coating on the ss316l alloy was 50 μm at 5 min and 30 v. the increase in coating thickness with the time and potential of deposition led to problems, including increases in roughness and weak adhesion of the coating layer.