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Design and Fabrication of a Narrow-Bandwidth Micromechanical Ring Filter using a Novel Process in UVLIGA Technology
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نویسنده
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Bijari A. ,Keshmiri S. H. ,Wanburee W. ,Sriphung C. ,Phatthanakun R.
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منبع
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iranian journal of electrical and electronic engineering - 2012 - دوره : 8 - شماره : 4 - صفحه:280 -289
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چکیده
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This paper presents a novel low-cost fabrication process for micromechanical filter in uv-liga technology. the micromechanical filter consists of the two identical bulk-mode ring resonators, mechanically coupled by a flexural-mode beam. the design procedure is performed by a mechanical lumped element model and ansys software. the low-cost fabrication process with only three uv-lithography steps is used to achieve a high aspect ratio of 20 with 3 ìm gap spacing. the fabricated filter is characterized using a fully differential drive and sense interface circuit. the experimental results demonstrates micromechanical filter with a center frequency of 10.31 mhz and percent bandwidth less than 0.3% using a dc-bias voltage of 60 v. the detailed fabrication process can be applied as an appropriate alternative to x-ray liga and silicon-based micromechanical filters.
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کلیدواژه
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Micromechanical Ring Filter ,Nickel Electroplating ,SU-8 Photoresist ,UV- LIGA.
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آدرس
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ferdowsi university of mashhad, Faculty of Engineering, Department of Electrical Engineering, ایران, ferdowsi university of mashhad, Faculty of Engineering, Department of Electrical Engineering, ایران, Suranaree University of Technology (SUT), School of Electrical Engineering, Institute of Engineering, Thailand, Synchrotron Light Research Institution(SLRI), Thailand, Synchrotron Light Research Institution(SLRI), Thailand
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Authors
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