Nano-structual changes in N+ ion implanted nickel thin films deposited on 316 and 304 type stainless steel as a function of substrate temperature
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نویسنده
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Habibi M.
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منبع
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journal of theoretical and applied physics - 2010 - دوره : 3 - شماره : 4 - صفحه:14 -18
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چکیده
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Ni thin films of 250 nm thickness were coated on 304 and 316 types stainless steels and post n+ ion implanted with15 kev energy and a flux of 5 x 1017 n+cm-2 at 300 and 400 k substrate temperatures. the surface nano-structure ofthe samples were analysed using x-ray diffraction (xrd) and atomic force microscopy (afm). nano-structure andcrystallography of the films showed the development of ni3n(111) and ni4n(111) orientation and a decrease in thegrain size and surface roughness with increasing the substrate temperature, which can be due to the initial preferredsputtering of the grain boundaries.
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کلیدواژه
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Ni thin film ,N+ ion implantation ,XRD ,AFM
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آدرس
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islamic azad university, Department of Physics, ایران
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پست الکترونیکی
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m_habibi_pprc@yahoo.com
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