>
Fa   |   Ar   |   En
   Influence of annealing temperature on nano-stracture of Ti-Oxide thin films  
   
نویسنده Khojier K. ,Savaloni H.
منبع journal of theoretical and applied physics - 2009 - دوره : 3 - شماره : 1 - صفحه:9 -13
چکیده    Titanium films of 37.6 nm thickness were deposited on stainless steel type 304, and they were post-annealed underflow of oxygen at different temperatures. the structure of the films was analysed using rbs, xrd and afm. theresults showed an initial reduction of the grain size and surface roughness at 473 k annealing temperature, but grainsize and surface roughness increased at higher temperatures. it is observed that the crystallographic structure of thefilm goes through a sudden change at 943 k annealing temperature and three phases of titanium oxide (i.e., rutile,anatase and brokite) are formed. the rbs spectra showed that oxygen density and penetration depth in the sampleincreased with annealing temperature.
کلیدواژه Titanium oxide ,Thin film ,RBS ,XRD ,AFM
آدرس islamic azad university, Department of Physics, ایران. islamic azad university, Plasma Physics Research Center, ایران, islamic azad university, Plasma Physics Research Center, ایران. university of tehran, Department of Physics, ایران
پست الکترونیکی k_khojier@yahoo.com
 
     
   
Authors
  
 
 

Copyright 2023
Islamic World Science Citation Center
All Rights Reserved