A novel large-area surface-wave slot antenna (slan) 2.45-GHz microwaveplasma source

In this research a large-area surface-wave slot antenna microwave plasma source was designed and fabricated. usinga slot antenna excitation configuration, the design procedure of such source was based on producing flat uniformcylindrical plasma by launching a microwave at fixed frequency of 2.45ghz with a variable power up to 850w on adielectric window. the large time-stable plasma could be sustained in a relatively large surface (500cm^2) with anapproximated plasma density of almost 2 x10.cm^2a new tuning system for matching the impedance of the microwavecoupler to the plasma chamber with the impedance of the waveguide was devised and utilized. furthermore,on the basis of its equivalent circuit the algorithm for impedance matching is obtained. in addition, the vacuum(plasma) chamber has a totally uniform gas distribution system with circular symmetry to ensure the uniformityof the plasma, and also a movable substrate holder with a water cooling system that would make diverse waferprocesses in plasma processing technology possible. the configuration was simulated with cst microwave studioand fdtd code. the fabricated mechanical model and results of simulations are presented.