Growing of carbon nanowalls on glass substrate by HFCVD technique

This work concentrates on the growth of carbon nanowalls (cnws) using hot filament chemical vapour deposition(hf-cvd) technique on a glass substrate coated with al nanocatalyst. a combination of ch4/nh3/h2 andc2h2/nh3/h2 renders the growth of carbon nanostructures such as diamond nanocrystals, carbon nanowalls, andcarbon nanotubes. parameters affecting the growth of cnts such as c2h2 flow ratio, deposition time, and temperatureare investigated. low temperature plasma is applied for deposition of al nanocatalyst on the glass substrate.surface morphology of the substrate is observed by atomic force microscopy (afm). samples are characterized byscanning electron microscopy and raman spectroscopy. one of important conclusions in this work is that thegrowth of diamond nanocrystals and cnts depend on the hydrocarbon gas species in the fed gas and process parameters,respectively. it is also determined that, an increase of the hydrocarbon gas flow rate from 10 sccm to 20sccm causes the formation of the cnws on the substrate.