|
|
|
|
Nano-Structure and Electrical Properties of Titanium Thin Films as a Function of Substrate Temperature
|
|
|
|
|
|
|
|
نویسنده
|
Khojier K. ,Savaloni H. ,Ghoranneviss M
|
|
منبع
|
journal of theoretical and applied physics - 2008 - دوره : 2 - شماره : 2 - صفحه:37 -41
|
|
چکیده
|
The nano-structural and electrical properties of titanium thin film of 237 nm thickness deposited with a rate of 3.0nms' on glass substrates at different substrate temperatures (390, 470, 510 and 580 k) are studied . the nanostructureof these films was obtain ed using x-ra y diffraction (xrd) and atomic force microscopy (afm), while thethickness were measured by mean s of rutherford back scattering (res). xrd results show the development of a(112) ti02 preferred orientation by increasing the sub strate temperature. the results also show that the grain size,the roughness and the conductivity of these films increa se with substrate temperature
|
|
کلیدواژه
|
Ti thin films ; Conductivity; Gra in size; Roughness
|
|
آدرس
|
islamic azad university, Department of Physics. islamic azad university, Science and Research Campus, Plasma Physics Research Center, ایران, islamic azad university, Science and Research Campus, Plasma Physics Research Center, ایران. university of tehran, Departement of Physics, ایران, islamic azad university, Science and Research Campus, Plasma Physics Research Center, Tehran
|
|
پست الکترونیکی
|
k-khojier@yahoo.com.
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Authors
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|