Optical properties of silicon nano layers by using Kramers- Kronig method

Silicon thin layers are deposited on glass substrates with the thickness of 103 nm, 147 nm and 197nm. the layers are produced with electron gun evaporation method under ultra-high vacuum con-dition. the optical reectance and the transmittance of produced layers were measured by usingspectrophotometer. the optical functions such as, real and imaginary part of refractive index, realand imaginary part of dielectric constant, real and imaginary part of conductivity, absorption coe-cient and optical band gap energy are calculated basing on the kramers-kronig relations. the voidfractions of the silicon lms are calculated by using aspnes theorem. the eect of layer thickness onoptical properties of silicon thin lms is investigated.