the optical and electrochromic properties of tungsten oxide thin layer: the effect of deposition time

Tungsten oxide (wo3) thin layers were prepared on fluorine tin oxide glass using the electrodeposition method. wo3 layers were evaluated as a function of the deposition time (480 s, 600 s, 660 s and 720 s). sem results showed that by increasing the deposition time, a gradual decrement in cracks on their surface occurred. the electrochromic properties of the wo3 thin layers were investigated in a nonaqueous liclo4–pc electrolyte by means of optical transmittance, cyclic voltammogram (cv) measurements. the wo3 thin layer with the deposition of time 600 s exhibited a noticeable electrochromic performance with the variation of transmittance being up to 58.26% at 633nm. the cv measurements also revealed that the wo3 thin layer with the deposition time of 600 s had a high electrochemical reaction activity and reversibility due to its highly porous structure.

The optical and electrochromic properties of tungsten oxide thin layer: the effect of deposition time

Tungsten oxide (WO3) thin layers were prepared on Fluorine Tin Oxide glass by electrodeposition method. WO3 layers were evaluated as a function of the deposition time (480s, 600s, 660s and 720s).SEM results show that by increasing the deposition time, gradual decrement in cracks on their surface will occur. The electrochromic properties of the WO3 thin layers were investigated in a nonaqueous LiClO4 ndash;PC electrolyte by means of optical transmittance, cyclic voltammogram (CV) measurements. The WO3 thin layer with deposition time 600s exhibits a noticeable electrochromic performance with a variation of transmittance up to 58.26% at 633nm. The CV measurements reveal that the WO3 thin layer with deposition time 600s has high electrochemical reaction activity and reversibility due to its highly porous structure.