مقایسه ساختار و مورفولوژی لایه های نازک Cu بر زیر لایه GaAs در روش های الکتروانباشت و الکترولس

In this research cu thin films were grown on n-type gaas by electro and electroless deposition. some cu thin films were electrodeposited under constant current mode from 5 to 30 ma and some cu thin films were grown by electroless at various temperatures from 25 to 77 oc. their structures and morphology were studied by x-ray diffractometer (xrd) and scanning electron microscope (sem). roughness of both series of cu films was examined by atomic force microscope (afm).