مشخصه یابی خواص لایه نازک الکترواپتیکی ZnO:Alساخته شده به روش ترکیبی کندوپاش پلاسمایی ساده و اکسیداسیون حرارتی

The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. the dust particles appear as pollutant in this industrial processing. recently, however, they are seen from a different point of views – they can be useful in coatings various technologies for microelectronic, optic, electro-optic industrial. in this investigation we have concentrated on coating of dust particles by zno:al thin film. dust particles in the investigation are zn, al. thin films are fabrication by combination of plasma sputtering zn, al and thermal oxidation. these thin films have special physical properties, such as large bond strength, zno thin films exhibit high transparency in visible region and low electrical resistively. the electrical and optical properties of zno:al thin films were evaluated by xrd, rbs, the linear four point probe method and visible spectroscopy. the best electrical properties obtain and the transparent in 300-800 nm wavelengths is 85 percent.